COLLABORATION

 
SLOVAK REPUBLIC

• Institute of Electrical Engineering, Slovak Academy of Sciences, Bratislava, Slovakia www.elu.sav.sk
  SEM, FIB (Project CENTE), AFM, Deep-UV lithography, E-Beam Lithography, Dry Etching (RIE)
• Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Bratislava, Slovakia www.fei.stuba.sk
  Deep-UV lithography, Nanoimprint Lithography, Dry Etching (RIE)
• Department of Experimental Physics, Fakulty of mathematics, physics and informatics, Comenius University, Bratislava www.dep.fmph.uniba.sk
  E-Beam Lithography, SEM
• Biont, a.s., Bratislava, www.biont.sk
  Ion Beam Etching, Ion Projection Lithography, AFM

 
INTERNATIONAL

• Vorarlberg University of Applied Science, Research Center for Microtechnologies, Dornbirn, Austria www.en.fhv.at
• Ilmenau University of Technology, Faculty of Electrical Engineering and Information Technology, Institute of Micro- and Nanoelectronics, Dept. of Microelectronic and Nanoelectronic Systems, Ilmenau, Germany www.tu-ilmenau.de/mne
• Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Poland www.wemif.pwr.wroc.pl
• Institute of Microelectronics Technology, Russian Academy of Sciences, Chernogolovka, Moscow District, Russia www.ipmt-hpm.ac.ru