Publications: 2002 / 2003 / 2004 / 2005 / 2006 / 2007 / 2008 / 2009 / 2010

Publications/2009

 
PUBLICATIONS 2009

 

 

 
OEL Publications 2009

ADCA06

DUJAVOVÁ, Agáta - SOJKOVÁ, Michaela - GAŽI, Štefan - ŠTRBÍK, Vladimír - POLÁK, Milan - KOSTIČ, Ivan - CHROMIK, Štefan. The influence of the rhenium in the precursor film on the properties of the thin superconducting films based on thallium. In Physica C, 2009, vol. 469, p. 308-311. (0.740 - IF2008). ISSN 0921-4534.

ADCA07

GREGUŠOVÁ, Dagmar - MARTAUS, Jozef - FEDOR, Ján - KÚDELA, Róbert - KOSTIČ, Ivan - CAMBEL, Vladimír. On-tip sub-micrometer Hall probes for magnetic microscopy prepared by AFM lithography. In Ultramicroscopy, 2009, vol. 109, p. 1080-1084. (2.629 - IF2008).

ADCA08

VANKO, Gabriel - LALINSKÝ, Tibor - HAŠČÍK, Štefan - RÝGER, I. - MOZOLOVÁ, Želmíra - ŠKRINIAROVÁ, J. - TOMÁŠKA, M. - KOSTIČ, Ivan - VINCZE, A. Impact of SF6 plasma treatment on performance of AlGaN/GaN HEMT. In Vacuum, 2009, vol. 84, p. 235-237. (1.114 - IF2008). ISSN 0042-207X.

ADCA09

VUTOVA, Katia - KOLEVA, Elena - MLADENOV, Georgy - KOSTIČ, Ivan - TANAKA, T. - KAWABATA, Keishi. A simulation model for chemically amplified resist CAMP6. In Microelectronic Engineering : an international journal of semiconductor manufacturing technology, 2009, vol. 86, p. 714-717. (1.583 - IF2008). ISSN 0167-9317.

ADCA10

VUTOVA, Katia - KOLEVA, Elena - MLADENOV, Georgy - KOSTIČ, Ivan. Some peculiarities of resist-profile simulation for positive-tone chemically amplified resists in electron-beam lithography. In Journal of Vacuum Science Technology B, 2009, vol. 27, no. 1, p. 52-57. (1.445 - IF2008).

ADEB04

MLADENOV, Georgy - KOLEVA, Elena - VUTOVA, Katia - KOSTIČ, Ivan - SPIVAK, V. - BENČÚROVÁ, Anna - RITOMSKÝ, Adrian. Resist for electron beam nanolithography. In Bulgarian Journal of Physics, 2009, vol. 36, no. 5-6, p. 13-20. ISSN 1310-0157.

AEC23

KOSTIČ, Ivan - BARÁK, Vladislav - BENČÚROVÁ, Anna - ČAPLOVIČ, Igor - HRKÚT, Pavol - KONEČNÍKOVÁ, Anna - MATAY, Ladislav - NEMEC, P. - RITOMSKÝ, Adrian. E-beam lithography for photomask fabrication. In Multicantilever parallel scanning systems : proceedings: PRONANO Workshop 2009. Editor Peter Scharff. - Ilmenau : Ilmenau University of Technology, 2009, p. 71-78.

AEE01

LALINSKÝ, Tibor - VANKO, Gabriel - JAKOVENKO, J. - KUTIS, V. - IVANOVA, M. - HAŠČÍK, Štefan - MURIN, Jozef - HUSÁK, M. - KOSTIČ, Ivan. AlGaN/GaN HEMT based micro-hotplate for high temperature gas sensors. In MNE09 : 35th International Conference on Micro & Nano Engineering. - Ghent, 2009, p-MEMS-20.

AFDB01

MATAY, Ladislav - ANDOK, Róbert - BENČÚROVÁ, Anna - RITOMSKÝ, Adrian - KOSTIČ, Ivan - PARTEL, S. - HUDEK, Peter. Preparation method of large and complex defect-free chips directly-written by ZBA 21 e-beam tool. In APCOM 2009 : proceedings of the 15th International Conference on Applied Physics of Condensed Matter, held in KRÚ Bystrá, Liptovský Ján, Slovak Republic, June 24-26, 2009. Editor D. Pudiš, L. Harmatha, J. Müllerová, I. Jamnický. - Žilina : University of Žilina, 2009, p. 69-72. ISBN 978-80-554-0057-0.